Product Name: High Vacuum Magnetron Sputtering System with Samping Room Model NO.: JCPY500 Trademark: Technol Transport Package: Export Wooden Box Specification: Customize Origin: China HS Code: 8486202200 Product Description Features:1. Dual-use sputtering and evaporation function, less occupied area, competitive price, stable performance and low maintenance costs;2. Can be used for the preparation of single and multi-layer metal film, dielectric film, semiconductor film, magnetic film, sensor film, heat-resistant alloy film, hard film, corrosion-resistant film, etc.;3. Coating samples: silver, aluminum, copper, nickel, chromium, nickel-chromium alloy, titanium oxide, ITO, silica, etc.;4. Single target sputtering, multi-target sputtering in turns, multi-target sputtering simultaneously and so on functions.Technical Parameters:Equipment NameMagnetron Sputtering SystemModelJCPY500Chamber StructureVertical front door structure, rear pumping system, double-layer water coolingChamber SizeΦ500×H450mm, with Load-Lock function, supports taking in / out single or multiple substratesBaking TemperatureRoom temperature to 500ºC (932ºF)Sputtering PathUpwardRotating Substrate HolderΦ150mmFilm Thickness NonuniformityWithin the scope of Φ100mm≤±5.0%Sputtering Target / Evaporation Electrode2~4 Pcs of Φ2, Φ3, Φ4 Inches magnetron targets (optional)Process Gas3 Routes gas flow controlControl MethodPLC Control / IPC automatic control (optional)Occupied Area(Mainframe) L1800×W800×H1845mmPower≥15KwApplication: It is widely used in the research and small batch preparation of new film materials for colleges & universities, research institutes and enterprises.